Direct Write Photolithography

PHOTO3
Code
PHOTO3
Model
Durham Magneto Optics – MicroWriter ML 3 Pro
Location
Cleanroom
Primary Training Contact

Talmage Tyler and Jay Dalton

Operating Procedures
Helpful Links

DMO Website

The ML 3 Pro is a direct write photolithography tool, allowing for micro-fabrication with a variety of photoresists without the need for a physical mask.

 

Due to high usage on Photo3 the following reservation rules apply:

  1. Users can reserve the tool for a maximum of 4 hours per day.
  2. If you need to do a run that is longer than 4 hours, it can be run over night:
    • To create an overnight PHOTO3 run:
      1. Start your reservation at 8PM (or later) and extend it to midnight.
      2. Create another reservation (next day) 12AM-4AM
      3. Create another reservation 4AM-8AM
      4. You must have your sample removed no later than 8AM
Specifications
  • 230mm x 230mm x 15mm maximum wafer size (writing area: 195mm x 195mm)
  • 0.4μm, 0.6μm, 1μm, 2μm and 5μm minimum spot sizes (software selectable) 
  • Two light-sources: 365nm or 405nm (software selectable)
  • XY interferometer with 1nm resolution for precise motion control
  • Autofocus system using yellow light with real-time surface tracking laser
  • Back-side alignment capable
  • Greyscale exposure capable (255 levels)
  • User friendly interface