Image
Code
ASH2
Model
Glow Research AutoGlow 200
Location
Cleanroom
Primary Training Contact
Helpful Links
Applications
- Organic material removal through microincineration
- Photoresist ashing/removal
- Use of oxygen and/or argon gases for sample preparation or surface treatments
- PDMS bonding prep
Specifications
- 300 Watt RF generator
- Oxygen & Argon process gases
- Dry scroll pump (6CFM)
- Ability to do both Plasma and RIE modes
- Ability to process samples sizes up to 200mm (8-inch)
- Positive resist approximate Etch Rate in Plasma Mode at 100W: 23nm/min
- Positive resist approximate Etch Rate in Plasma Mode at 200W: 56nm/min