E-Beam Metal Evaporator

E-Beam Metal Evaporator
CHA Industries Solution E-Beam
Primary Training Contact

The CHA Solution electron beam (E-Beam) evaporator process development system is a small-scale vacuum deposition system designed for small lot processing and engineered to handle a wide range of deposition needs. Its fully water cooled stainless steel chamber allows for flexibility in optimizing process start temperatures. Included in this system is CHA’s SmartSource electron beam gun with motor driven crucible rotation and lift lid. Neodymium magnets are used in the SmartSource gun for strength that is not compromised by repeated gun cleanings and turret changes. It features a unique, interlocking crucible cover that prevents cross-contamination of source materials between its pockets during evaporation. The entire system is monitored and controlled with PLC automation with touchscreen interface.

  • Electron Beam (E-Beam) thin metal film evaporation from up to 4 independent sources
  • Metals available:
    • Ag, Au, Co, Cr, Ge, Mo, Ni, Pd, Ti, V
    • Contact SMIF to request other materials
  • Dome for holding  2 inch and/or 3 inch back loaded substrates positioned 90 degrees to the source
  • Dome for two 6 x 6 inch square back loaded substrates positioned 90 degrees to the source
  • ALL DOMES have chip holders for substrate pieces
  • Water cooled SmartSource electron beam gun
  • 4 x 25cc material source pockets
  • Source distance: 15 inches
  • Chamber volume: 4.5 cubic feet
  • PLC automation with touchscreen
  • Manual or automatic operational modes
  • Maxtek rate and thickness deposition controller integrated for control of shutter and electron beam power supply