Low Temp Anneal and High Temp Anneal for P-type doping

Low Temp Anneal and High Temp Anneal for P-type doping
Code
FURN2-Tube3
Model
Tempress 6304 4-Stack Furnace
Location
Cleanroom
Primary Training Contact

Jay Dalton

Contact SMIF if you are interested in using this furnace.  This equipment is operated by SMIF staff only.

All samples must be approved by SMIF and go through SMIF approved cleaning prior to processing

Applications
  • Low temperature annealing (400C-600C) in N2 or Forming Gas
  • High temperature annealing (up to 1050C) in N2 of P-type substrates
Features

Capable of handling small pieces up to 4" wafers (6" possible with additional boats)

Specifications
  • Temperature range: 400C - 1050C
  • N2 or Forming Gas (H2/N2) ambient  for low temp annealing
  • N2 for high temp annealing of P-type substrates