Image
Code
PECVD1
Model
Advanced Vacuum Vision 310
Location
Cleanroom
Primary Training Contact
Helpful Links
Applications
- Deposition of oxide, nitride and oxynitride films
Features
- Easy load chamber
- Variable substrate heating up to 300 C
- RF and Low Frequency (LF) generators
Specifications
- SiO2 deposition rate ~350 A/min
- Si3N4 deposition rate ~100 A/min