High Temperature Anneal N-type doping

High Temperature Anneal N-type doping
Code
FURN2-Tube1
Model
Tempress 6304 4-Stack Furnace
Location
Cleanroom
Primary Training Contact

Jay Dalton

Contact SMIF if you are interested in using this furnace.  This equipment is operated by SMIF staff only.

All samples must be approved by SMIF and go through SMIF approved cleaning prior to processing

Applications
  • High temperature annealing for N-type doped substrates
Features
  • Capable of handling small pieces up to 4" wafers (6" possible with additional boats)
Specifications
  • Temperature range: 750C - 1050C
  • N2 ambient