Contact SMIF if you are interested in using this furnace. This equipment is operated by SMIF staff only.
All samples must be approved by SMIF and go through SMIF approved cleaning prior to processing
- High temperature annealing for N-type doped substrates
- Capable of handling small pieces up to 4" wafers (6" possible with additional boats)
- Temperature range: 750C - 1050C
- N2 ambient