Atomic Layer Deposition (ALD) Now Available in SMIF cleanroom

A Kurt Lesker ALD-150X Plasma Enhanced Atomic Layer Deposition (PE-ALD) system is now on-line. Films available by request are Al2O3, HFO2, ZrO2, HFZrO2, and TiN (coming soon). For more information and to request ALD processing, click here.