Contact SMIF if you are interested in using this furnace. This equipment is operated by SMIF staff only.
All samples must be approved by SMIF and go through SMIF approved cleaning prior to processing
- Low temperature annealing (400C-600C) in N2 or Forming Gas
- High temperature annealing (up to 1050C) in N2 of P-type substrates
Capable of handling small pieces up to 4" wafers (6" possible with additional boats)
- Temperature range: 400C - 1050C
- N2 or Forming Gas (H2/N2) ambient for low temp annealing
- N2 for high temp annealing of P-type substrates